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A Versatile Approach for Biomaterial Patterning: Masked Ion Beam Lithography

Published online by Cambridge University Press:  15 March 2011

Kenneth E. Gonsalves ,
Wei He ,
David B. Poker ,
Nikola Batina  and
Lhadi Merhari
Kenneth E. Gonsalves
Affiliation:
Department of Chemistry & C.C. Cameron Applied Research Center, University of North Carolina, Charlotte, NC 28223
Wei He
Affiliation:
Institute of Material Science, U-136, University of Connecticut, Storrs, CT 06269
David B. Poker
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831
Nikola Batina
Affiliation:
Departmento de Quimica, Universidad Autonoma Metropolitana-Iztapalapa, 09340 Mexico D.F., Mexico
Lhadi Merhari
Affiliation:
CERAMEC R&D, F-87000, Limoges, France
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Abstract

We describe a new approach for biomaterial patterning, viz, masked ion beam lithography. Poly (methyl methacrylate) (PMMA) film was used as a model system and subjected to Ca+ and P+ ion implantations through masks. Ca+ ion implantation was performed at an energy of 85 keV with a fluence of 1×1014 ions/cm2. P+ ion implantation was done at an energy of 85 keV with fluences of 1×1015 and 1×1016 ions/cm2. Arrays of holes were generated during these processes. AFM showed that the depth of the holes is in the nanoscale region. The surface hydrophobicity of the exposed PMMA films was investigated by contact angle measurement. The results indicated that ion implantation changed the surface hydrophobicity.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 705: Symposium Y – Nanopatterning–From Ultralarge-Scale Integration to Biotechnology , 2001 , Y4.6
Copyright
Copyright © Materials Research Society 2002

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