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New designs of hydrophobic and mesostructured Ultra Low k materials with isolated mesopores
Published online by Cambridge University Press: 22 June 2011
Abstract
In this work, hydrophobic mesostructured organosilica thin films, exhibiting isolated mesopores (~ 7 nm), have been successfully deposited by spin-coating using different polystyrene-block-polyethylene oxide copolymers (PS-b-PEO) as structure-directing agents and methyltriethoxysilane (MTES) as organosilica precursor. Different ordered mesostructures (Face Centered Cubic, 2D or 3D Hexagonal and Body Centered Cubic) can be achieved by controlling different synthesis parameters. X-Ray Diffraction (XRD) and Grazing Incidence Small Angle X-Ray Scattering (GISAXS) techniques were used to investigate the mesostructure evolution through thermal and UV treatments. Swelling and shrinkage were evidenced by in-situ XRD and X-Ray Reflectivity measurements during the thermal removal of the meso-templates. Infrared spectroscopy and 29Si NMR were additionally used to investigate the microstructure evolution. The film porosity was estimated thanks to Ellipsometry Porosimetry (EP). Correlation between mechanical properties through nanoindentation measurements and the mesostructure ordering is discussed as well as assessments of the dielectric constant k by mercury contact probe.
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- Copyright © Materials Research Society 2011