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Microstructure Characterization of Amorphous Silicon Based Alloys by Inert Gas Effusion Studies

Published online by Cambridge University Press:  17 March 2011

Wolfhard Beyer ,
Sergio S. Camargo Jr  and
Rosari Saleh
Wolfhard Beyer
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich, D-52425 Jülich, Germany
Sergio S. Camargo Jr
Affiliation:
Programa de Engenharia Metalúrgica e de Materiais, Universidade Federal do Rio de Janeiro, Rio de Janeiro, RJ, CEP 21945-970, Brazil
Rosari Saleh
Affiliation:
Jurusan Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam, Universitas Indonesia, Depok 16424, Indonesia
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Abstract

It is shown that inert gas effusion employing implanted neon and argon atoms is a useful tool for microstructure characterization of a-Si based alloys. The method measures sensitively interconnected voids and gives information about sizes of microstructure. Limitations of the method are discussed. The results show network reconstruction effects in a-Si:O:H and a-Si:C:H alloys as a function of annealing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 609: Symposium A – Amorphous & Heterogeneous Silicon Thin Films – 2000 , 2000 , A23.4
Copyright
Copyright © Materials Research Society 2000

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References

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