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Dislocation Trapping Potential Measured by SEM-CCM
Published online by Cambridge University Press: 28 February 2011
Abstract
The intensity of contrast and width of the image of a single dislocation in silicon were measured versus bias of Schottky barrier at room temperature. A regime of measurements was established, which reduced dramatically the number of variable parameters involved in contrast formation. In addition, using the right regime of SEM-CCM one can determine the position of a defect relative to the surface of the specimen without doing TEM measurements. It was shown for the first time that from contrast readout one can determine the dislocation electrical potential. A model of image formation is discussed.
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- Copyright © Materials Research Society 1985
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