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Behavior of Crack Growth Resistance in Toughened Silicon Nitride Ceramics

Published online by Cambridge University Press:  15 February 2011

H. Kawamoto ,
K. Hiramatsu ,
Y. Takigawa ,
A. Okada  and
H. Usami
H. Kawamoto
Affiliation:
R&D Laboratory, Japan Fine Ceramics Center, Nagoya, 456-8587Japan
K. Hiramatsu
Affiliation:
R&D Laboratory, Japan Fine Ceramics Center, Nagoya, 456-8587Japan
Y. Takigawa
Affiliation:
R&D Laboratory, Japan Fine Ceramics Center, Nagoya, 456-8587Japan
A. Okada
Affiliation:
Scientific Research Laboratory, Nissan Motor Co., Ltd., Yokosuga, 237-8523Japan
H. Usami
Affiliation:
Meijo University, Nagoya, 468-8502Japan
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Abstract

Testing methods for crack-growth resistance-curve (R-curve) behavior were investigated and developed to analyze the toughened mechanism in polycry stalline ceramics. These methods are a biaxial-flexure method for small-scale disc-shaped specimens with micro-indentation cracks and a single-edged notched beam flexural method with crack stabilizers. In both methods, the growing crack length is measured directly as a function of applied stress, using the system that consist of a microscope and a CCD camera. Applying these testing methods, R-curve behavior of a toughened silicon nitride with a preferred orientation of elongated grains was evaluated to characterize the toughened mechanism, comparing with the behavior in a commercially available silicon nitride. The behavior having these rising R-curves is discussed with emphasis on the effects of microstructure such as grain-growth and grain-orientation, and resultant grain-bridgings behind the crack-tip.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 539: Symposium M – Fracture & Ductile vs. Brittle Behavior - Theory, Modelling… , 1998 , 113
Copyright
Copyright © Materials Research Society 1999

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