Hostname: page-component-6bf8c574d5-956mj Total loading time: 0 Render date: 2025-02-15T10:07:53.764Z Has data issue: false hasContentIssue false

Two-layer Model for Electroabsorption and Built-in Potential Measurements on a-Si:H pin Solar Cells

Published online by Cambridge University Press:  10 February 2011

Lin Jiang
Affiliation:
Department of Physics, Syracuse University, Syracuse, NY 13244-1130
E. A. Schiff
Affiliation:
Department of Physics, Syracuse University, Syracuse, NY 13244-1130
Get access

Abstract

Modulated Electroabsorption (EA) measurements have been widely used to estimate built-in potentials (Vbi) in semiconductor devices. The method is particularly simple in devices for which the built-in potential is dropped in a single layer of the device. However, experimental results in amorphous silicon and organic devices can involve at least 2 layers. In the present paper we consider the information which can be obtained about 2-layer semiconductor devices from electroabsorption measurements. In particular we describe a 2-layer EA model appropriate to a-Si:H based pin solar cells, for which both the p+ and i layers contribute to the EA signal. We present an analysis of capacitance and second harmonic measurements which yields the EA coefficient for the p+ layer of the device, and we present measurements on a-Si:H pin devices which appear consistent with this analysis. Wavelength dependent EA then yields the built-in potential across the 2-layer device.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Nonomura, S., Okamoto, H. and Hamakawa, Y., Jap. J. Appl. Phys. 21 (1982) L464.Google Scholar
[2] Hamakawa, Y., Semiconductors and Semimetals Vol.21B (1984) p141.Google Scholar
[3] Weiser, G., Dersch, U. and Thomas, P., Phil. Mag. B57 (1988) 721.Google Scholar
[4] Wang, Q., Schiff, E. A. and Hegedus, S. S., collected in Amorphous Silicon Technology-1994, edited by Schiff, E. A. et al (Mat. Res. Soc. Symp. Proc. Vol.336), p36 5.Google Scholar
[5] Campbell, I. H., Joswick, M. D. and Parker, I. D., Appl. Phys. Lett. 67 (1995) 3171.Google Scholar