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Correlation Between In Situ Optical Emission Spectroscopy in a Reactive O2 / AR RF Magnetron Sputtering Discharge and PZT Thin Film Composition

Published online by Cambridge University Press:  10 February 2011

F. Ayguavives ,
P. Aubert ,
B. Ea-Kim  and
B. Agius
F. Ayguavives
Affiliation:
Laboratoire d'Etude des Matériaux en Films Minces, Université de Paris Sud, Plateau du Moulon, 91400 Orsay, France
P. Aubert
Affiliation:
Laboratoire d'Etude des Matériaux en Films Minces, Université de Paris Sud, Plateau du Moulon, 91400 Orsay, France
B. Ea-Kim
Affiliation:
Laboratoire d'Etude des Matériaux en Films Minces, Université de Paris Sud, Plateau du Moulon, 91400 Orsay, France
B. Agius*
Affiliation:
Laboratoire d'Etude des Matériaux en Films Minces, Université de Paris Sud, Plateau du Moulon, 91400 Orsay, France
*
*agius@iut-orsay.fr
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Abstract

Lead zirconate titanate (PZT) thin films have been grown by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb1.1(Zr0.4 Ti0.6 in a reactive argon / oxygen gas mixture. During plasma deposition, in situ Optical Emission Spectroscopy (OES) measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities (Zr - 386.4 nm, Ti - 399.9 nm, Pb - 405.8 nm and O - 777.2 nm) and the thin-film composition determined by a simultaneous use of Rutherford Backscattering Spectroscopy (RBS) and Nuclear Reaction Analysis (NRA).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 493: Symposium U – Ferroelectric Thin Film VI , 1997 , 333
Copyright
Copyright © Materials Research Society 1998

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References

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