Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing, edited by A. Bouchoule. Wiley, New York, 1999, 408 pages. ISBN 0 471 97386 6. £90.

P. K. SHUKLA

doi:10.1017/S002237780023852X

Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing, edited by A. Bouchoule. Wiley, New York, 1999, 408 pages. ISBN 0 471 97386 6. £90.

Published online by Cambridge University Press: 08 November 2000

P. K. SHUKLA

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P. K. SHUKLA: Affiliation:
Ruhr-Universität Bochum, Germany

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Type: BOOK REVIEWS
Information: Journal of Plasma Physics , Volume 64 , Issue 2 , August 2000 , pp. 201 - 203

DOI: https://doi.org/10.1017/S002237780023852X [Opens in a new window]

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Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing, edited by A. Bouchoule. Wiley, New York, 1999, 408 pages. ISBN 0 471 97386 6. £90.

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